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Semiconductor fabrication PECVD processing solution

Managing low and high temperatures in Semiconductor PECVD processing for solar cell fabrication

Plasma-enhanced chemical vapor deposition (PECVD) processing

The process we describe here is specifically the diffusion and plasma-enhanced chemical vapor deposition (PECVD) for solar cell fabrication. PECVD is a chemical vapor deposition process to grow and deposit ultra-thin films onto the wafer from a gas state.

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Manufacturing challenges

Eurotherm precision temperature and power control

Managing complex cycle stages at low and high temperatures

High accuracy control maintains varying temperature ranges

Temperature disturbances - detrimental to quality and uniformity of wafer

Decisive and fast response to process disturbances

Managing process lags and temperature uniformity between zones

Cascade control regulates spike temperature and profile temperature across zones

Need fast rise to setpoint and precise tracking of desired ramp rates without overshoot

Precision PID control maintains process variables close to setpoint, even during ramps

PECVD vacuum chambers with Eurotherm control solution

Typically, two or up to four vacuum chambers per machine
Eurotherm true power control
Two control outputs with different gain
Control of up to four AIN heaters

Discuss your semiconductor requirements

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Power control systems (electrification)

Data management software

PAC/PLC control systems

Paperless Data Recorders

SSR/SCR Power Controllers

PID Controllers and/or Hi-limit devices

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Semiconductor fabrication PECVD processing solution

Plasma-enhanced chemical vapor deposition (PECVD) processing

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PECVD vacuum chambers with Eurotherm control solution

Discuss your semiconductor requirements

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